At InPrint 2017, November 14-16, Munich Trade Fair Centre, Munich, Germany, GEW will display its range of arc lamp and LED UV curing systems for printing and coating applications — available in widths from 10cm up to 2.5m from the use of a single lamp. GEW UV systems are widely used for applications in the inkjet and industrial printing industries.
GEW’s patented LED UV curing solutions are designed with demanding industrial applications in mind. They are some of the most powerful LED UV curing designs of their kind. Consideration was given to the advanced cooling design to ensure effective heat dissipation at high power levels of up to 27W/cm2, dependent on wavelength. GEW’s LW2 system has uniform UV output and wavelength across the full curing width and is built for reliability, long-term consistent output and extended life cycles.
GEW’s patented NUVA2 arc lamp UV system is engineered for efficiency and low maintenance. Active air-cooling and optically tuned reflectors maximise the curing effect of the maps while simultaneously reducing heat radiation onto the substrate. In any UV curing installation, the NUVA2 and the associated RHINO power supply achieve accelerated production speeds, increased uptime and energy savings of up to 50 per cent, backed up with the security of a five-year warranty.